2 Pieces Interdigitated Electrode Array capacitance Monocrystalline Silicon Chip Gold Electrode (Small)
Description
- 1. overall size: 4mm*4.3mm.
- 2. Line Width: 5um, line space: 3um.
- 3. Electrode substrate is monocrystalline silicon with 300nm thickness of SiO2 on the surface of the silicon wafer.
- 4. Conductor layer structure: Cr/Au, the thickness are10nm and 100nm respectively.
- 5. The suitable temperature for using is from - 100 degrees Celsius to +400 degrees Celsius.
Size:Small 1. overall size: 4mm*4.3mm. 2. Line Width: 5um, line space: 3um. 3. Electrode substrate is monocrystalline silicon with 300nm thickness of SiO2 on the surface of the silicon wafer. 4. Conductor layer structure: Cr/Au, the thickness are10nm and 100nm respectively. 5. The suitable temperature for using is from - 100 degrees Celsius to +400 degrees Celsius. 6.This high precision silicon interdigital electrode is widely used in chemical, physical and medical sensors, with reliable performance and stable quality!
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